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Contract Awarded For Iii-v Icp Etcher dtu Requires An Icp Reactive Ion Etcher To Etch Iii-v Materials With A Special Focus On Etching Gaas Micropillar Devices From A Planar Microcavity ( the Instrument ). The System Is Expected To Be Delivered As Soon As in JAPAN
| TI Ref No: | 528207613 |
| Date : | 30 Jan 2026 |
| Description: | Contract Awarded For Iii-v Icp Etcher dtu Requires An Icp Reactive Ion Etcher To Etch Iii-v Materials With A Special Focus On Etching Gaas Micropillar Devices From A Planar Microcavity ( the Instrument ). The System Is Expected To Be Delivered As Soon As, JAPAN |
| Document Type | Contract Awards |
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